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Precision Etching and Coating System (PECS), Gatan

The PECS has the ability to sputter coat material on to a surface and/or to etch the surface. Argon ions are used for both coating and etching processes.

Precision Etching and Coating System (PECS), Gatan

Contacts and Location

Contact 1 Andžāne Jana
Enquire about this equipment
Organisational Unit Institute of Chemical Physics
    University of Latvia

Description

The PECS has the ability to sputter coat material on to a surface and/or to etch the surface. Argon ions are used for both coating and etching processes.

Specification

  • Sputtering coat material on to a surface, mechanical cleaning/etching the surface with Ar ions.
  • Three individual ion sources (ion energy 1-10KeV),
  • Etching area 7mm – 10mm dependent on gun energy,
  • Etching rate 10μm/hr for silicon and 3μm/hr for tungsten at 10.0keV;
  • Coating rate 0.5Å/sec for carbon and 1.5Å/sec for chromium at 10.0keV;
  • Uniform over a 1 inch diameter;
  • Two dual target sets, externally selectable while under vacuum;
  • Target materials: Au, Au/Pt, Ag, C, SiO2, Cr, Ti, Al

Services

Sputtering coat material on to a surface, mechanical cleaning/etching the surface with Ar ions.

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