Contacts and Location
Contact 1 | jana Andžāne |
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Enquire about this equipment | |
Organisational Unit |
Institute of Chemical Physics University of Latvia |
Description
An advanced Chemical Vapour Deposition process development tool controlled by proprietary real-time process control software that provides recipe driven process control, real-time graphing and automatic data logging for optimal process reproducibility
Specification
Services
Monolayer and multilayer graphene synthesis on copper and nickel substrates (max size of a substrate 2.5cmx5cm. At the moment the recipe is developed only for synthesis of monolayer graphene on copper substrates.
Manufacturer
CVD Equipment Corporation
Model
Easy Tube101, CVD Equipment Corporation Gas cabinets AGA-K, model DS 52 4B, AGA Latvia, a member of