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Nanoparticle sputtering system

High vacuum system with magnetron sputtering of thin films and nanoparticles

Nanoparticle sputtering system

Contacts and Location

Contact 1 Edmunds Tamanis
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Organisational Unit Daugavpils university - Latvia, Daugavpils

Description

High vacuum system with magnetron sputtering of thin films and nanoparticles

Specification

Possible sputtering of thin metal, semiconductor, oxides films. Layers from nanoparticles up to three materials in core and fourth material as shell. Controlled diameter of nanoparticles. Sample sizes - 20x20 mm.

Services

Thin metal, semiconductor, oxide films, layers of different types of nanoparticles.

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