Contacts and Location
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Organisational Unit |
Riga Technical University Liepāja University NANO laboratory - Latvia, Rīga |
Description
Chemical vapor deposition (CVD) represents a viable synthesis route to produce good-quality, large-area graphene films. In simple words, the technique relies on the thermal decomposition of a carbon-rich source and the further deposition of carbon atoms in a honeycomb pattern on top of a metallic catalyst film.
Specification
".For horizontal or vertical operatation up to 1800°C in gas atmosphere or vacuum applications Insulation with vacuum-formed ceramic fiber plates provide fast heating time and greater energy efficiency MoSi2 heating elements, mounted vertically for easy replacement Ceramic working tube with fiber plugs for applications in air"
Services
Chemical vapor deposition
Contract title
Contract short description
Contract full description
".Horizontālai vai vertikālai darbībai līdz 1800°C gāzes atmosfērā vai vakuumā Izolācija ar vakuumformētām keramisko šķiedru plāksnēm nodrošina ātru sildīšanas laiku un lielāku energoefektivitāti MoSi2 sildelements, uzstādīts vertikāli vieglai nomaiņai Keramikas darba caurule ar šķiedras aizbāžņiem lietošanai gaisā"
Embedded Content
Funding Source
EU Structual Funds (ERAF, ESF) | - |
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Manufacturer
Nabertherm GmbH
Model
RHTH 120-300/17
Funded by EU