Equipment for development of thin films, functional materials and nanostructured materials.
- Heating Chamber 135 x 135 x135 mm3, useful volume 2 Litres. The chamber is gas and vacuum tight.
- Microwave supply: 6 independent magnetrons, 800 W each; total MW power 4,8 kW, adjustable from 15 - 100 %, power density up to104 W/Litre, frequency 2450 MHz +/- 50.
- Temperature. Operating temperature up to1700°C (continuous operation) and up to1750°C (short terms operation). Temperature measuring by pyrometer, range 300 – 2000 0C.
- Heating of non-conductive material is possible due to use SiC susceptors.
- Protective gases supply. Heating in protective gas is possible. Two gas connections with shut-off valves and needle closing valves are installed. The flow meter with needle valve for the protective gas is in the gases supply lines. In the exhaust gas line there is a flow control valve.
- Process Guiding Software. Software ECS-2000 and controller SE 402 are used.
Furnace is applicable for sintering of ceramics, superconductor processing, sample annealing as well as driving out organic materials and predrying.