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A chemical vapor deposition (CVD) facility for graphene synthesis

Chemical vapor deposition (CVD) represents a viable synthesis route to produce good-quality, large-area graphene films. In simple words, the technique relies on the thermal decomposition of a carbon-rich source and the further deposition of carbon at

A chemical vapor deposition (CVD) facility for graphene synthesis

Contacts and Location

Description

Chemical vapor deposition (CVD) represents a viable synthesis route to produce good-quality, large-area graphene films. In simple words, the technique relies on the thermal decomposition of a carbon-rich source and the further deposition of carbon atoms in a honeycomb pattern on top of a metallic catalyst film.

Specification

".For horizontal or vertical operatation up to 1800°C in gas atmosphere or vacuum applications Insulation with vacuum-formed ceramic fiber plates provide fast heating time and greater energy efficiency MoSi2 heating elements, mounted vertically for easy replacement Ceramic working tube with fiber plugs for applications in air"

Services

Chemical vapor deposition

Contract title

Ķīmisko tvaiku nogulsnēšanās (CVD) iekārta grafēna sintēzei

Contract short description

Ķīmiskā tvaiku pārklāšana (CVD) ir dzīvotspējīgs sintēzes ceļš, lai iegūtu labas kvalitātes lielas platības grafēna plēves. Vienkāršiem vārdiem sakot, šī tehnika balstās uz ar oglekli bagāta avota termisko sadalīšanos un turpmāku oglekļa atomu nogulsnēšanos šūnveida veidā uz metāla katalizatora plēves.

Contract full description

".Horizontālai vai vertikālai darbībai līdz 1800°C gāzes atmosfērā vai vakuumā Izolācija ar vakuumformētām keramisko šķiedru plāksnēm nodrošina ātru sildīšanas laiku un lielāku energoefektivitāti MoSi2 sildelements, uzstādīts vertikāli vieglai nomaiņai Keramikas darba caurule ar šķiedras aizbāžņiem lietošanai gaisā"

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Funding Source

EU Structual Funds (ERAF, ESF) -
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